Graphene as transparent electrode for direct observation of hole photoemission from silicon to oxide

photoemission from silicon to oxide Rusen Yan (闫汝森), Qin Zhang, Oleg A. Kirillov, Wei Li, James Basham, Alex Boosalis, Xuelei Liang, Debdeep Jena, Curt A. Richter, Alan C. Seabaugh, David J. Gundlach, Huili G. Xing, and N. V. Nguyen Semiconductor and Dimensional Metrology Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA Key Laboratory for the Physics and Chemistry of Nano Devices, Peking University, Beijing, China Department of Electrical Engineering and Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, Nebraska 68588, USA